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description: W rozprawie przedstawiono metodę obliczeniową, która pozwala na uproszczenie projektowania oraz umożliwia sterowanie przebiegiem procesu dyfuzji domieszek do kryształu półprzewodnika. Metoda ta umożliwia obliczenie parametrów predyfuzji i redyfuzji pojedynczego procesu dyfuzji, dla których rozkład wdyfundowanej domieszki we wnętrzu półprzewodnika będzie najbliższy żądaniom konstruktora przyrządu. Użyty opis procesu został skonstruowany tak, że możliwe jest uwzględnianie w nim wpływu, jaki mają na dyfundującą domieszkę wszystkie operacje termiczne, a w tej liczbie również procesy dyfuzji innych domieszek. Opis procesu oraz zastosowany algorytm obliczeń zapewniają dużą szybkość działania całej metody. Uwzględnienie wzajemnych wpływów wszystkich dyfuzji na siebie daje możliwość zautomatyzowania wstępnych prac przy projektowaniu przyrządu. Uzyskana szybkość działania pozwala z kolei na wykorzystanie omawianej tu metody do sterowania całym procesem produkcji przyrządu, poprzez szybką modyfikację parametrów technologicznych kolejnych dyfuzji, dokonywanych na podstawie pomiarów efektów uzyskiwanych w procesach dyfuzji już wykonanych. W pracy dokonano niezbędnych uproszczeń i przybliżeń, aby zakres stosowalności proponowanej metody był możliwe szeroki. Oprócz rozważań teoretycznych w pracy przedstawiono implementację proponowanej metody oraz przykłady numeryczne.
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